2009/09/07 by Samuel Lara-Avila, Samuel Lara‐Avila, Alexei Kalaboukhov +9 · 13 citations
Materials Science · Physics and Astronomy · #Condensed matter physics #Epitaxy #Graphene #Graphene research and applications #Materials science #Nanotechnology #Optoelectronics #Physics #Quantum #Quantum and electron transport phenomena #Quantum mechanics #Surface and Thin Film Phenomena #cond-mat.mes-hall
paper · pdf · doi:10.1038/nnano.2009.474
published as Nature Nanotechnology 5, 186 - 189 (2010) · Submitted
arxiv created 2009/09/07 · openalex publication_date 2010/01/17 · arxiv updated 2010/04/28 · openalex created_date 2025/10/10 · openalex updated_date 2026/08/05
We report development of a quantum Hall resistance standard accurate to a few parts in a billion at 300 mK and based on large area epitaxial graphene. The remarkable precision constitutes an improvement of four orders of magnitude over the best results obtained in exfoliated graphene and is similar to the accuracy achieved in well-established semiconductor standards. Unlike the traditional resistance standards the novel graphene device is still accurately quantized at 4.2 K, vastly simplifying practical metrology. This breakthrough was made possible by exceptional graphene quality achieved with scalable silicon carbide technology on a wafer scale and shows great promise for future large scale applications in electronics.