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Landau Quantization and the Thickness Limit of Topological Insulator Thin Films ofSb2Te3

2011/11/07 by Yeping Jiang, Yilin Wang, Mu Chen +10 · 231 citations
Materials Science · Mathematics · Physics and Astronomy · #Algorithm #Computer graphics (images) #Computer science #Condensed matter physics #Graphene research and applications #Limit (mathematics) #Mathematical analysis #Mathematics #Phase-change materials and chalcogenides #Physics #Quantization (signal processing) #Topological Materials and Phenomena #Topological insulator #cond-mat.mtrl-sci

paper · pdf · doi:10.1103/physrevlett.108.016401

published in Physical Review Letters 108(1), 016401 (American Physical Society) · 17 pages, 4 figures

arxiv created 2011/11/07 · openalex publication_date 2012/01/03 · arxiv updated 2012/01/05 · openalex created_date 2016/06/24 · openalex updated_date 2026/08/05

Abstract

We report the experimental observation of Landau quantization of molecular beam epitaxy grown Sb2Te3 thin films by a low-temperature scanning tunneling microscope. Different from all the reported systems, the Landau quantization in a Sb2Te3 topological insulator is not sensitive to the intrinsic substitutional defects in the films. As a result, a nearly perfect linear energy dispersion of surface states as a 2D massless Dirac fermion system is achieved. We demonstrate that four quintuple layers are the thickness limit for a Sb2Te3 thin film being a 3D topological insulator. The mechanism of the Landau-level broadening is discussed in terms of enhanced quasiparticle lifetime.

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