2010/11/04 by Minhao Liu, Cui‐Zu Chang, Cui-Zu Chang +13 · 1 citation
Materials Science · Physics and Astronomy · #Advanced Condensed Matter Physics #Graphene research and applications #Topological Materials and Phenomena #cond-mat.mtrl-sci #cond-mat.str-el
paper · pdf · doi:10.1103/physrevb.83.165440
published as Phys. Rev. B 83, 165440 (2011) · 4 figures
arxiv created 2010/11/04 · openalex publication_date 2011/04/26 · arxiv updated 2013/05/29 · openalex created_date 2016/06/24 · openalex updated_date 2026/07/28
We report a transport study of ultrathin Bi2Se3 topological insulators with thickness from one quintuple layer to six quintuple layers grown on sapphire by molecular beam epitaxy. At low temperatures, the film resistance increases logarithmically with decreasing temperature, revealing an insulating ground state. The insulating behavior becomes more pronounced in thinner films. The sharp increase of resistance with magnetic field, however, indicates the existence of weak antilocalization originated from the topological protection. We show that this unusual insulating ground state in the two-dimensional limit of topological insulators is induced by the combined effect of strong electron interaction and topological delocalization.