2001/01/22 by Nam Kim, Klavs Hansen, J. Jussi Toppari +4 · 2 citations
Engineering · Physics and Astronomy · #Cathode ray #Chemical vapor deposition #Condensed matter physics #Electron #Electron beam physical vapor deposition #Electron-beam lithography #Evaporation #Fabrication #Lithography #Magnetic properties of thin films #Materials science #Mesoscopic physics #Metallurgy #Nanotechnology #Niobium #Optoelectronics #Particle accelerators and beam dynamics #Physics #Physics of Superconductivity and Magnetism #Resist #Superconductivity #cond-mat.mes-hall #cond-mat.supr-con
paper · pdf · doi:10.1116/1.1445168
3 pages, 4 figures
arxiv created 2001/01/22 · openalex publication_date 2002/01/01 · arxiv updated 2015/06/24 · openalex created_date 2016/06/24 · openalex updated_date 2026/08/05
Conventional electron-beam lithography has been used to fabricate mesoscopic Nb wires. Nb was deposited in an ultrahigh vacuum evaporation chamber using electron gun heating. The typical linewidth and the thickness were 200 and 50 nm, respectively. The transition temperatures were above 7 K. They increased with thickness and linewidth. To demonstrate the feasibility of two angle evaporation techniques, we also fabricated Nb/(Al–)AlOx/Nb tunnel junctions showing superconducting single-electron transistor characteristics.