2015/03/10 by Shujie Tang, Haomin Wang, Hui Shan Wang +12 · 1 citation
Engineering · Materials Science · Physics and Astronomy · #Graphene and Nanomaterials Applications #Graphene research and applications #Semiconductor materials and devices #cond-mat.mtrl-sci
paper · pdf · doi:10.1038/ncomms7499
published as Nature Communications 6:6499 (2015) · 21 pages, 5 figures, Supplementary information
arxiv created 2015/03/10 · arxiv updated 2015/03/11 · openalex publication_date 2015/03/11 · openalex created_date 2025/10/10 · openalex updated_date 2026/08/04
The direct growth of high-quality, large single-crystalline domains of graphene on a dielectric substrate is of vital importance for applications in electronics and optoelectronics. Traditionally, graphene domains grown on dielectrics are typically only ~1 nm with a growth rate of ~1 nm/min or less, the main reason is the lack of a catalyst. Here we show that silane, serving as a gaseous catalyst, is able to boost the graphene growth rate to ~1 um/min, thereby promoting graphene domains up to 20 um in size to be synthesized via chemical vapor deposition on hexagonal boron nitride. Hall measurements show that the mobility of the sample reaches 20,000 cm2/Vs at room temperature, which is among the best for CVD-grown graphene. Combining the advantages of both catalytic CVD and the ultra-flat dielectric substrate, gaseous catalyst-assisted CVD paves the way for synthesizing high-quality graphene for device applications while avoiding the transfer process.