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Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers

2022/09/23 by Luca Forrer, Aurèle Kamber, Forrer, Luca +7
Physics and Astronomy · Engineering · #Surface and Thin Film Phenomena #Force Microscopy Techniques and Applications #Advancements in Photolithography Techniques

paper · pdf · doi:10.48550/arxiv.2209.11503

Abstract

We developed a process to fabricate nanoscale metallic gate electrodes on scanning probe cantilevers, including on the irregular surface of protruding cantilever tips. The process includes a floating-layer technique to coat the cantilevers in electron-beam resist. We demonstrate gate definition through a lift-off process, as well as through an etching process. The cantilevers maintain a high force sensitivity after undergoing the patterning process. Our method allows the patterning of nanoscale devices on fragile scanning probes, extending their functionality as sensors.

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