A Guideline for Silicon Carbide MOSFET Thermal Characterization based on Source-Drain Voltage

2022/11/28 by Yi Zhang, Zhang, Yi, Yichi Zhang +11
Engineering · #Advancements in Semiconductor Devices and Circuit Design #Applied Physics (physics.app-ph) #FOS: Physical sciences #Silicon Carbide Semiconductor Technologies #Silicon and Solar Cell Technologies

paper · pdf · doi:10.48550/arxiv.2211.15174

openalex publication_date 2022/11/28 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28

Abstract

Thermal transient measurement based on source-drain voltage is a standard method to characterize thermal properties of silicon semiconductors but is doubtful to be directly applied to silicon carbide (SiC) devices. To evaluate its feasibility and limitations, this paper conducts a comprehensive investigation into its accuracy, resolution, and stability towards yielding the structure information of SiC MOSFET using the source-drain voltage as the temperature sensitive electrical parameter. The whole characterization process involves two main procedures and associated key testing parameters, such as gate voltages, sensing and heating currents, etc. Their impacts on both the static and dynamic performances are also investigated with the aim of providing a guideline for conducting a reproducible thermal transient measurement for SiC MOSFETs.

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