- Gas-phase chemistry and etching mechanism of SiNx thin films in C4F8 + Ar inductively coupled plasma
2019/05/29 by Nomin Lim, Alexander Efremov, Kwang-Ho Kwon +1 · 22 citations
Chemistry · Engineering · #Analytical Chemistry (journal) #Chemistry #Etching (microfabrication) #Fluorocarbon #Inductively coupled plasma #Ion #Langmuir probe #Layer (electronics) #Materials science #Metal and Thin Film Mechanics #Nanotechnology #Organic chemistry #Plasma #Plasma Diagnostics and Applications #Plasma diagnostics #Plasma modeling #Reactive-ion etching #Semiconductor materials and devices #Thin film