Plasma assisted polishing of single crystal SiC for obtaining atomically flat strain-free surface

2011/01/01 by Kazuya Yamamura, K. Yamamura, Tatsuya Takiguchi +9 · 217 citations
Chemistry · Engineering · Materials Science · #Abrasive #Advanced Surface Polishing Techniques #Chemistry #Composite material #Crystal (programming language) #Crystallography #Diamond and Carbon-based Materials Research #Materials science #Metal and Thin Film Mechanics #Metallurgy #Nanoindentation #Optoelectronics #Plasma #Polishing #Silicon carbide #Single crystal #Surface finish #Surface roughness #Wafer

paper · doi:10.1016/j.cirp.2011.03.072

published in CIRP Annals 60(1), 571-574 (Elsevier BV)

openalex publication_date 2011/01/01 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28

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