Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate

2024/06/14 by Takayoshi Oshima, Yuichi Oshima
#Ga2O3 #HCl gas etching

paper · doi:10.48505/nims.4267

Abstract

Applied Physics Express. 16 [6] (2023)

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