2024/07/14 by Md Tahmidul Alam, Jiahao Chen, Alam, Md Tahmidul +13
Engineering · Physics and Astronomy · #Advancements in Semiconductor Devices and Circuit Design #Applied Physics (physics.app-ph) #FOS: Physical sciences #GaN-based semiconductor devices and materials #Semiconductor Quantum Structures and Devices
paper · pdf · doi:10.48550/arxiv.2407.10354
openalex publication_date 2024/07/14 · openalex created_date 2025/10/10 · openalex updated_date 2026/08/01
High voltage (~2 kV) AlGaN-channel HEMTs were fabricated with 64% Aluminum composition in the channel. The average on-resistance was ~75 ohm. mm (~21 miliohm. cm2) for LGD = 20 microns. Breakdown voltage reached >3 kV (tool limit) before passivation however it reduced to ~2 kV after SiN surface passivation and field plates. The apparent high breakdown voltage prior to passivation can possibly be attributed to the field plate effect of the charged trap states of the surface. The breakdown voltage and RON demonstrated a strong linear correlation in a scattered plot with ~50 measured transistors. In pulsed IV measurements with 100 microsecond pulse width and 40 V of off-state bias (tool limit), the dynamic RON increased by ~5% compared to DC RON and current collapse was <10%.