Peak amplitude of target current determines deposition rate loss during high power pulsed magnetron sputtering

2015/11/12 by G. Greczynski, Grzegorz Greczyński, L. Hultman +1 · 65 citations
Chemistry · Engineering · #Amplitude #Analytical Chemistry (journal) #Atomic physics #Chemistry #Growth rate #High-power impulse magnetron sputtering #Ion #Ion-surface interactions and analysis #Ionization #Materials science #Metal and Thin Film Mechanics #Nanotechnology #Optics #Physics #Range (aeronautics) #Semiconductor materials and devices #Sputter deposition #Sputtering #Thin film

paper · open access · doi:10.1016/j.vacuum.2015.11.004

published in Vacuum 124, 1-4 (Elsevier BV)

openalex publication_date 2015/11/12 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28

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