Vertical sidewall of silicon nitride mask and smooth surface of etched-silicon simultaneously obtained using CHF3/O2 inductively coupled plasma

2022/11/03 by Jiabao Sun, Zhengyang Chen, Shiqi Zhou +11 · 1 citation
Engineering · #Semiconductor materials and devices #Plasma Diagnostics and Applications #Metal and Thin Film Mechanics

paper · doi:10.1016/j.vacuum.2022.111650

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