2018/09/20 by Wei Li, Yuzhe Ma, Li, Wei +11 · 1 citation
Computer Science · Engineering · #Advancements in Photolithography Techniques #FOS: Computer and information sciences #Other Computer Science (cs.OH) #VLSI and Analog Circuit Testing #VLSI and FPGA Design Techniques
paper · pdf · doi:10.48550/arxiv.1809.07554
openalex publication_date 2018/09/20 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28
Multiple patterning lithography has been widely adopted in advanced technology nodes of VLSI manufacturing. As a key step in the design flow, multiple patterning layout decomposition (MPLD) is critical to design closure. Due to the NP-hardness of the general decomposition problem, various efficient algorithms have been proposed with high quality solutions. However, with increasingly complicated design flow and peripheral processing steps, developing a high-quality layout decomposer becomes more and more difficult, slowing down the further advancement in this field. This paper presents OpenMPL [1], an open-source layout decomposition framework, with well-separated peripheral processing and the core solving steps. We demonstrate the flexibility of the framework with efficient implementations of various state-of-the-art algorithms, which enable us to reproduce most of the recent results on widely-recognized benchmarks. We believe OpenMPL can pave the road for developing layout decomposition engines and stimulate further researches on this problem.