Multi-scale modeling of chemical vapor deposition processes for thin film technology

2007/01/27 by Chris R. Kleijn, C.R. Kleijn, R. Dorsman +4 · 2 citations
Engineering · #Advanced Surface Polishing Techniques #Advancements in Photolithography Techniques #Chemical engineering #Chemical process #Chemical vapor deposition #Computer science #Deposition (geology) #Engineering #Materials science #Mechanical engineering #Nanotechnology #Physics #Process (computing) #Process engineering #Process simulation #Scale (ratio) #Semiconductor materials and devices #Wafer

paper · doi:10.1016/j.jcrysgro.2006.12.062

openalex publication_date 2007/01/27 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28

Citations

• Modeling and simulation of SiC CVD in the horizontal hot-wall reactor concept

Cited by

• Experimental and Simulation Research on the Preparation of Carbon Nano-Materials by Chemical Vapor Deposition. [europepmc]
• Competitive co-diffusion as a route to enhanced step coverage in chemical vapor deposition. [europepmc]