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Selective tuning of high-Q silicon photonic crystal nanocavities via laser-assisted local oxidation

2011/06/03 by Charlton J. Chen, Jiangjun Zheng, Tingyi Gu +7 · 1 citation
Engineering · Materials Science · Physics and Astronomy · #Laser #Materials science #Optics #Optoelectronics #Photonic Crystals and Applications #Photonic and Optical Devices #Photonic crystal #Physics #Silicon #Silicon Nanostructures and Photoluminescence #physics.optics

paper · pdf · doi:10.1364/oe.19.012480

12 pages, 7 figures

arxiv created 2011/06/03 · openalex publication_date 2011/06/13 · arxiv updated 2015/05/28 · openalex created_date 2025/10/10 · openalex updated_date 2026/08/05

Abstract

We examine the cavity resonance tuning of high-Q silicon photonic crystal heterostructures by localized laser-assisted thermal oxidation using a 532 nm continuous wave laser focused to a 2.5 μm radius spot-size. The total shift is consistent with the parabolic rate law. A tuning range of up to 8.7 nm is achieved with ∼ 30 mW laser powers. Over this tuning range, the cavity Qs decreases from 3.2×10(5) to 1.2×10(5). Numerical simulations model the temperature distributions in the silicon photonic crystal membrane and the cavity resonance shift from oxidation.

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