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Enhanced third harmonic generation from the epsilon-near-zero modes of ultrathin films

2015/02/13 by Ting S. Luk, Domenico de Ceglia, Sheng Liu +7 · 3 citations
Engineering · Physics and Astronomy · #Condensed matter physics #Energy conversion efficiency #Frequency conversion #Indium tin oxide #Materials science #Nanoscopic scale #Nanotechnology #Optics #Optoelectronics #Phonon #Photonic and Optical Devices #Physics #Plasmon #Plasmonic and Surface Plasmon Research #Second-harmonic generation #Substrate (aquarium) #Thermal Radiation and Cooling Technologies #Thin film #Tin #Wavelength #Zero (linguistics) #cond-mat.mes-hall #physics.optics

paper · pdf · doi:10.1063/1.4917457

published as Appl. Phys. Lett. 106, 151103 (2015) · 13 pages, 5 figures

arxiv created 2015/02/13 · openalex publication_date 2015/04/13 · arxiv updated 2015/04/14 · openalex created_date 2025/10/10 · openalex updated_date 2026/08/05

Abstract

We experimentally demonstrate efficient third harmonic generation from an indium tin oxide nanofilm (λ/42 thick) on a glass substrate for a pump wavelength of 1.4 μm. A conversion efficiency of 3.3 × 10−6 is achieved by exploiting the field enhancement properties of the epsilon-near-zero mode with an enhancement factor of 200. This nanoscale frequency conversion method is applicable to other plasmonic materials and reststrahlen materials in proximity of the longitudinal optical phonon frequencies.

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