2019/10/25 by Alexander John Cruz, Ivo Stassen, Mikhail Krishtab +14 · 1 citation
Chemistry · Materials Science · #Metal-Organic Frameworks: Synthesis and Applications #ZnO doping and properties #Corrosion Behavior and Inhibition
paper · doi:10.1021/acs.chemmater.9b03435
openalex publication_date 2019/10/25 · openalex created_date 2025/10/10 · openalex updated_date 2026/08/04
Robust and scalable thin-film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for the zeolitic imidazolate framework-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated via a combination of in situ monitoring and ex situ characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices.