Lithographic performances of aryl sulfonate ester-modified polystyrenes as nonchemically amplified resists

2025/01/01 by Rongrong Peng, Peng Lian, Jinping Chen +9 · 1 voice
Engineering · Materials Science · #Advancements in Photolithography Techniques #Copper Interconnects and Reliability #Nanofabrication and Lithography Techniques

paper · pdf · doi:10.1039/d5im00046g

openalex publication_date 2025/01/01 · openalex created_date 2025/06/13 · openalex updated_date 2026/07/28

Abstract

n-CARs based on aryl sulfonate ester-functionalized polystyrenes gave an impressive 18 nm L/S and 10 nm L/4S EBL patterns, highlighting the effect of substituents on the lithographic performance of the n-CARs.

Discussions

• ✨Paper in Special Issue: Advanced Electronic Chemicals✨ Discover how substituents impact n-CAR efficiency in this new ICM article from researchers at Institute of Chemistry, CAS. 🔗 doi.org/10.1039/ [bsky, 1 points, 0 comments]

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