Outside Front Cover: Solution ALD of (CH 3 NH 3 )(PbI 3 ) Perovskite Thin Films Yields Functional Quality and Stability Superior to Classical Processing (Angew. Chem. Int. Ed. 3/2026)

2025/11/23 by Vanessa M. Koch, Xinyi Zeng, Andreas S. Deckert +27 · 1 voice
Engineering · Materials Science · #Chemical and Physical Properties of Materials #Electronic and Structural Properties of Oxides #Perovskite Materials and Applications

paper · pdf · doi:10.1002/anie.2025-m1711054000

openalex publication_date 2025/11/23 · openalex created_date 2025/11/25 · openalex updated_date 2026/06/14

Abstract

Atomic layer deposition builds up solids in individual atomic steps by a cyclic repetition of successive surface reactions. In the Communication (e13903) by Julien Bachmann and co-workers this approach is adapted to form high-quality halide perovskite thin films from dissolved precursors. Pivalate ligands solubilize lead ions and deliver them to the surface, enabling rapid, controlled film growth. In situ investigations capture the moment of nucleation in the process of forming the semiconductor.

Discussions

• Our #ChemPrint paper on solution #ALDep (sALD) of a halide #perovskite w stability & carrier lifetimes improved wrt state-of-the-art #processing is on the cover of @angewandtechemie.bsky.social! Check [bsky, 2 points, 0 comments]

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