2005/08/12 by V. B. Vyssotsky, E. V. Lobko, A. S. Lobko
Physics and Astronomy · #physics.ins-det
published as Vyssotsky V.B., Lobko E.V., Lobko A.S. // Proc. 5th Intl. Conf. ''Education, Industry, International Relation'', Minsk-2004, p. 268-271 (in Russian) · 3 pages, 2 figures
arxiv created 2005/08/12 · arxiv updated 2009/12/01
Ultra-thin crystal targets in shape of self-supporting membranes were produced for our experiments with parametric x-rays emitted by low-energy electrons. Concise description of the technology developed for production of silicon crystal membranes and the technique for the membrane thickness measurements are considered in the paper. Membrane thickness of ~0.5 micron at 1.0 mm diameter supporting by 2x2 mm silicon substrate of ~200 microns thickness is achieved. Developed technology for thin crystal membrane production can also be applied for manufacturing of various membrane-containing sensors