Dielectric properties of Ag/Si thin film prepared by ion-beam assisted deposition for energy storage applications

2026/07/01 by M.M. Abdelhamied, M. M. Abdelhamied, A.M. Abdelreheem +2
Engineering · Materials Science · #Copper Interconnects and Reliability #Dielectric materials and actuators #Semiconductor materials and devices

paper · doi:10.1016/j.physb.2026.419127

openalex publication_date 2026/07/29 · openalex created_date 2026/07/30 · openalex updated_date 2026/08/02

Citations

• Dispersion and Absorption in Dielectrics I. Alternating Current Characteristics
• Frequency and voltage dependence of electrical and dielectric properties in metal-interfacial layer-semiconductor (MIS) type structures