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The effects of ion implantation damage to photonic crystal\n optomechanical resonators in silicon

2021/09/28 by Cliona Shakespeare, Shakespeare, Cliona, Teemu Loippo +5
Engineering · Physics and Astronomy · #Advanced MEMS and NEMS Technologies #FOS: Physical sciences #Materials Science (cond-mat.mtrl-sci) #Mechanical and Optical Resonators #Mesoscale and Nanoscale Physics (cond-mat.mes-hall) #Optics (physics.optics) #Photonic and Optical Devices

paper · pdf · doi:10.48550/arxiv.2109.13856

openalex publication_date 2021/09/28 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28

Abstract

Optomechanical resonators were fabricated on a silicon-on-insulator (SOI)\nsubstrate that had been implanted with phosphorus donors. The resonators'\nmechanical and optical properties were then measured (at 6 kelvin and room\ntemperature) before and after the substrate was annealed. All measured\nresonators survived the annealing and their mechanical linewidths decreased\nwhile their optical and mechanical frequencies increased. This is consistent\nwith crystal lattice damage from the ion implantation causing the optical and\nmechanical properties to degrade and then subsequently being repaired by the\nannealing. We explain these effects qualitatively with changes in the silicon\ncrystal lattice structure. We also report on some unexplained features in the\npre-anneal samples. In addition, we report partial fabrication of\noptomechanical resonators with neon ion milling.\n

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