2024/12/30 by Jun Peng, Rakshith Venugopal, Peng, Jun +5
Engineering · #Advanced Surface Polishing Techniques #FOS: Physical sciences #Materials Science (cond-mat.mtrl-sci) #Plasma Diagnostics and Applications #Semiconductor materials and devices
paper · pdf · doi:10.48550/arxiv.2412.20653
openalex publication_date 2024/12/30 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28
In the relentless pursuit of advancing semiconductor technologies, the demand for atomic layer processes has given rise to innovative processes, which have already played a significant role in the continued miniaturization features. Among these, atomic layer etching (ALE) is gaining increasing attention, offering precise control over material removal at the atomic level. Despite some thermal ALE achieved sub-nm etching controllability, the currently practical ALE processes that involve plasmas steps often suffer from high etch rates due to the scarcity of highly synergistic ALE half-reactions. To overcome this limitation, we developed an ALE process of silicon dioxide (SiO2) on a silicon wafer using sequential pure sulfur hexafluoride (SF66 gas exposure and argon (Ar) plasma etching near room temperature, achieving a stable and consistent etching rate of approximately 1.4 Å/cycle. In this process, neither of the two half-cycle reactions alone produces etching effects, and etching only occurs when the two are repeated in sequence, which means a 100% synergy. The identification of temperature and plasma power windows further substantiates the high synergy of our ALE process. Moreover, detailed morphology characterization over multiple cycles reveals a directional etching effect. This study provides a reliable, reproducible, and highly controllable ALE process for SiO2 etching, which is promising for nanofabrication processes.