Atomic-layer etching (ALE) of SiO₂ — comparison set

2025/11/10 by Daeun Hong, Yongjae Kim, Heeyeop Chae
Engineering · #Advancements in Semiconductor Devices and Circuit Design #Materials Science and Engineering #Nanowire Synthesis and Applications #Semiconductor materials and devices

paper · doi:10.48366/r1562498

openalex publication_date 2025/11/10 · openalex created_date 2025/11/11 · openalex updated_date 2026/07/01

Abstract

This review compiles six structured comparisons distilled from “Atomic Layer Etching of SiO₂ for Nanoscale Semiconductor Devices: A Review.”

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