2017/08/21 by I. S. Amiri, Volker J. Sorger, Amiri, Iraj S +7
Engineering · #Applied Physics (physics.app-ph) #FOS: Physical sciences #Microfluidic and Capillary Electrophoresis Applications #Nanofabrication and Lithography Techniques #Optics (physics.optics) #Photonic and Optical Devices
paper · pdf · doi:10.48550/arxiv.1708.06788
openalex publication_date 2017/08/21 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28
This paper reports on an approach for fabrication of micro-channels with nanometer thickness achieved by optimization of UV lithography processes. Rectangular micro-channels with a staple edge are fabricated over the surface of a silicon wafer substrate in which a sub-micron layer of diluted SU-8 thin film has been coated. The optimization of the process parameters including the duration of a two-step pre- and post-baking process, UV exposure dosage, and finally chemical developing time with constant agitation produces micro-channels with high contrast edges and thickness below 100 nm is achieved. The dimensions achieved using this approach has potential applications in sub-micron optical waveguides and nanoelectromechanical (NEMS) devices.