2002/10/23 by P. Karmakar, Prasanta Karmakar, Karmakar, P. +2
Engineering · Materials Science · Physics and Astronomy · #FOS: Physical sciences #Ion-surface interactions and analysis #Materials Science (cond-mat.mtrl-sci) #Microstructure and mechanical properties #Surface Roughness and Optical Measurements #cond-mat.mtrl-sci
paper · pdf · doi:10.48550/arxiv.cond-mat/0210518
arxiv created 2002/10/23 · openalex publication_date 2002/10/23 · arxiv updated 2009/11/30 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28
A 30 nm Pt thin film evaporated onto a Si wafer was sputtered by 8 keV Ar+ ions at various ion doses. The evolution of the modified sputtered films was monitored by atomic force microscopy (AFM), high resolution scanning electron microscopy (HRSEM) and Rutherford backscattering spectrometry (RBS). The most interesting observation was the formation of mound-like structures on the metal surface. Morphological data were quantitatively analysed within the framework of the dynamic scaling theory. Analyses of the height-height correlation function for different doses yield roughness exponents α in the range 0.65 - 0.87, while the root-mean-square roughness amplitude w evolves with the dose ϕ as a power law w∝ ϕβ, with the growth exponent, β ≈ 0.3. The results are discussed.