2008/05/23 by Xinran Wang, Wang, Xinran, Scott M. Tabakman +4
Engineering · Materials Science · Physics and Astronomy · #Electron and X-Ray Spectroscopy Techniques #Graphene research and applications #Semiconductor materials and devices #cond-mat.mtrl-sci
paper · pdf · doi:10.48550/arxiv.0805.3712
6pages, 3 figures, J. Am. Chem. Soc. in press
arxiv created 2008/05/23 · arxiv updated 2009/12/01
We investigate Atomic Layer Deposition (ALD) of metal oxide on pristine and functionalized graphene. On pristine graphene, ALD coating can only actively grow on edges and defect sites, where dangling bonds or surface groups react with ALD precursors. This affords a simple method to decorate and probe single defect sites in graphene planes. We used perylene tetracarboxylic acid (PTCA) to functionalize graphene surface and selectively introduced densely packed surface groups on graphene. Uniform ultrathin ALD coating on PTCA graphene was achieved over large area. The functionalization method could be used to integrate ultrathin high-k dielectrics in future graphene electronics.