Influence of oxygen partial pressure on structural, transport and magnetic properties of Co doped TiO2 films

2007/05/10 by Ali, Bakhtyar, Rumaiz, Abdul K, Shah, S. Ismat +2
#FOS: Physical sciences #Materials Science (cond-mat.mtrl-sci)

paper · doi:10.48550/arxiv.0705.1527

Abstract

Thin films of Co-TiO2 are deposited on silicon and quartz substrates using Pulse Laser Deposition (PLD) process at various oxygen partial pressures ranging from 6.6 x 10-3 Pascals (Pa) to 53 Pa. Crystal structure, transport and magnetic properties of reduced CoxTi(1-x)O2 (0

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