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Tuning carrier density and phase transitions in oxide semiconductors using focused ion beams

2022/02/03 by Hongyan Mei, Alexander Koch, Mei, Hongyan +23 · 1 citation
Biochemistry, Genetics and Molecular Biology · Materials Science · #Advanced Electron Microscopy Techniques and Applications #Applied Physics (physics.app-ph) #Copper-based nanomaterials and applications #Electronic and Structural Properties of Oxides #FOS: Physical sciences #Materials Science (cond-mat.mtrl-sci) #Optics (physics.optics)

paper · pdf · doi:10.48550/arxiv.2202.01777

openalex publication_date 2022/02/03 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28

Abstract

We demonstrate spatial modification of the optical properties of thin-film metal oxides, zinc oxide and vanadium dioxide as representatives, using a commercial focused ion beam (FIB) system. Using a Ga+ FIB and thermal annealing, we demonstrated variable doping of a band semiconductor, zinc oxide (ZnO), achieving carrier concentrations from 1018 cm-3 to 1020 cm-3. Using the same FIB without subsequent thermal annealing, we defect-engineered a correlated semiconductor, vanadium dioxide (VO2), locally modifying its insulator-to-metal transition (IMT) temperature by range of ~25 degrees C. Such area-selective modification of metal oxides by direct writing using a FIB provides a simple, mask-less route to the fabrication of optical structures, especially when multiple or continuous levels of doping or defect density are required.

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