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Electric-field-intensity-modulated scattering as a thin-film depth probe

2019/07/31 by Peter J. Dudenas, Adam Z. Weber, Ahmet Kusoglu
Materials Science · Physics and Astronomy · #Beam (structure) #Beamline #Electric field #Electron and X-Ray Spectroscopy Techniques #Force Microscopy Techniques and Applications #Intensity (physics) #Materials science #Nanostructure #Nanotechnology #Optics #Physics #Refractive index #Scattering #Surface and Thin Film Phenomena #Thin film #cond-mat.soft #physics.app-ph #physics.optics

paper · pdf · doi:10.1107/s1600576720013047

8 pages, 8 figures Revision Comments: The title has been changed to reflect the expanded scope of the revised manuscript. Theoretical background for the technique has been expanded. Data analysis for the single layer films was re-done, using updated beam divergence and energy resolution values. Finally, an additional section on bi-layer films has been added

arxiv created 2019/12/20 · openalex publication_date 2020/11/05 · arxiv updated 2020/11/10 · openalex created_date 2025/10/10 · openalex updated_date 2026/08/05

Abstract

Grazing-incidence X-ray scattering is a common technique to elucidate nanostructural information for thin-film samples, but depth-resolving this nanostructure is difficult using a single or few images. An in situ method to extract film thickness, the index of refraction and depth information using scattering images taken across a range of incident angles is presented here. The technique is described within the multilayer distorted-wave Born approximation and validated using two sets of polymer thin films. Angular divergence and energy resolution effects are considered, and implementation of the technique as a general beamline procedure is discussed. Electric-field-intensity-modulated scattering is a general technique applicable to myriad materials and enables the acquisition of depth-sensitive information in situ at any grazing-incidence-capable beamline.

Citations