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Raman microprobe analysis during the direct laser writing of silicon microstructures

1986/01/13 by F. Magnotta, Irving P. Herman · 2 citations
Engineering · Materials Science · #Laser Material Processing Techniques #Diamond and Carbon-based Materials Research #Laser-induced spectroscopy and plasma

paper · doi:10.1063/1.96941

openalex publication_date 1986/01/13 · openalex created_date 2025/10/10 · openalex updated_date 2026/06/26

Abstract

Raman microprobe techniques are used for the first time as a real-time probe during local direct laser writing and also as an in situ probe after writing. The Stokes–Raman emission observed during pyrolytic deposition of micron-dimension structures of silicon on germanium and vitreous carbon substrates is found to be weaker, more asymmetric, and to peak at a smaller Raman shift than the corresponding spectrum of the same structure similarly probed in situ after deposition. Results of detailed post-deposition Raman analysis of these silicon microstructures are presented and compared to the Raman spectra of oven-heated silicon. Potential applications of these techniques are discussed.

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