2010/07/07 by Michel Zamboni-Rached, Michel Zamboni‐Rached, Leonardo A. Ambrósio +3 · 51 citations
Engineering · Materials Science · Physics and Astronomy · #Aperture (computer memory) #Attenuation #Attenuation coefficient #Diffraction #Fresnel diffraction #Materials science #Near-Field Optical Microscopy #Optical Coatings and Gratings #Optics #Orbital Angular Momentum in Optics #Physics #Ptychography #physics.optics
paper · pdf · open access · doi:10.1364/ao.49.005861
published in Applied Optics 49(30), 5861 (Optica Publishing Group) · 24 pages, 6 figures
arxiv created 2010/07/07 · openalex publication_date 2010/10/14 · arxiv updated 2015/05/19 · openalex created_date 2025/10/10 · openalex updated_date 2026/08/05
Recently, a method for obtaining diffraction-attenuation resistant beams in absorbing media has been developed in terms of suitable superposition of ideal zero-order Bessel beams. In this work, we show that such beams keep their resistance to diffraction and absorption even when generated by finite apertures. Moreover, we shall extend the original method to allow a higher control over the transverse intensity profile of the beams. Although the method is developed for scalar fields, it can be applied to paraxial vector wave fields, as well. These new beams have many potential applications, such as in free-space optics, medical apparatus, remote sensing, and optical tweezers.