2012/01/03 by Shamir Rosen, I. Afek, Itai Afek +4
Computer Science · Physics and Astronomy · #Computer science #Interference (communication) #Interferometry #Laser-Matter Interactions and Applications #Lithography #Optics #Orbital Angular Momentum in Optics #Phase (matter) #Photon #Physics #Quantum #Quantum Information and Cryptography #Quantum entanglement #Quantum mechanics #Quantum optics #Spontaneous parametric down-conversion #Telecommunications #quant-ph
paper · pdf · doi:10.1103/physrevlett.109.103602
5 pages, 4 figures
arxiv created 2012/01/03 · openalex publication_date 2012/09/06 · arxiv updated 2013/05/29 · openalex created_date 2025/10/10 · openalex updated_date 2026/08/05
Quantum lithography achieves phase superresolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable with reduced use of quantum resources and, consequently, enhanced resistance to loss. The scheme is an implementation of interferometric lithography using a mixture of a spontaneous parametric down-converted entangled state with intense classical coherent light. We measure coincidences of up to four photons mimicking multiphoton absorption. The results show a narrowing of the interference fringes of up to 30% with respect to the best analogous classical scheme using only 10% of the nonclassical light required for creating NOON states.