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Effect of oxygen-doping onBi2Sr2Ca2Cu3O10+δvortex matter: Crossover from electromagnetic to Josephson interlayer coupling

2008/02/19 by A. Piriou, Yanina Fasano, Y. Fasano +2 · 32 citations
Materials Science · Mathematics · Physics and Astronomy · #Artificial intelligence #Computer science #Magnetic and transport properties of perovskites and related materials #Magnetic properties of thin films #Mathematics #Physics of Superconductivity and Magnetism #cond-mat.supr-con

paper · pdf · open access · doi:10.1103/physrevb.77.184508

published in Physical Review B 77(18) (American Physical Society) · Erroneous duplicate of arXiv:0802.2617

arxiv created 2008/02/19 · openalex publication_date 2008/05/13 · arxiv updated 2010/08/24 · openalex created_date 2016/06/24 · openalex updated_date 2026/08/05

Abstract

We study the effect of oxygen-doping on the critical temperature Tc, the vortex matter phase diagram, and the nature of the coupling mechanism between the Cu-O layers in the three-layer Bi2Sr2Ca2Cu3O_10+\ensuremathδ (Bi-2223) compound. Contrary to previous reports, in the overdoped (OD) regime, we do find a variation in Tc by increasing the oxygen partial pressure of the postannealing treatment. This variation is less significant than in the bilayer compound Bi2Sr2CaCu2O_10+\ensuremathδ (Bi-2212) and does not follow the universal Tc vs \ensuremathδ relation. Magnetic measurements reveal that increasing \ensuremathδ enlarges the field and temperature stability of the Bragg glass phase. These findings imply that the interlayer coupling between Cu-O layers enhances with \ensuremathδ. The anisotropy parameter estimated from directional first-penetration field measurements monotonously decreases from 50 in the underdoped (UD) to 15 in the OD regimes. However, the in-plane penetration depth presents a boomerang-type behavior with \ensuremathδ, reaching its minimum value close to optimal doping. These two facts lead to a crossover from a Josephson OD to electromagnetic UD-dominated coupling of adjacent Cu-O layers in the vicinity of optimal doping.

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