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Thermal re-emission model

2001/03/31 by Amit K. Chattopadhyay
Materials Science · Mathematics · Physics and Astronomy · #Material Dynamics and Properties #Stochastic processes and statistical mechanics #Theoretical and Computational Physics #cond-mat.stat-mech

paper · pdf · doi:10.1103/physrevb.65.041405

4 pages, minor textual corrections and typos, accepted in Physical Review B (rapid)

arxiv created 2001/11/22 · openalex publication_date 2002/01/04 · arxiv updated 2009/11/30 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28

Abstract

Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2+1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like \ensuremathα\ensuremath≈z\ensuremath≈1 and in 1+1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.

Citations