1984/01/01 by W.H. Ip, Te-Long Chiu, Tsung-Ching Wu +1 · 1 citation
Engineering · #Advancements in Photolithography Techniques #Advancements in Semiconductor Devices and Circuit Design #Semiconductor materials and devices
paper · doi:10.1109/isscc.1984.1156664
openalex publication_date 1984/01/01 · openalex created_date 2016/06/24 · openalex updated_date 2026/07/29
A 125ns, 50mW 256Kb EPROM featuring 12V-16V programming will be described. The design utilizes a 1.5μm N-well CMOS on epi technology resulting In a cell size of 37.5μm2and a die size of 180 mil ×180 mil.