2024/09/06 by Zhiyuan Ma, Tianyi Li, Xiaoqiang Dai +10 · 1 voice
Engineering · Neuroscience · #Nanofabrication and Lithography Techniques #Neuroscience and Neural Engineering #Nonlinear Optical Materials Studies
paper · pdf · doi:10.1002/adfm.202409859
openalex publication_date 2024/09/06 · openalex created_date 2025/10/10 · openalex updated_date 2026/08/04
Abstract Two‐photon lithography (TPL) is a powerful tool for 3D nanofabrication, however, high‐throughput TPL remains challenging, especially for cationic‐based photoresists. A novel cationic‐based photoresist named TP‐EO is developed for high‐throughput and high‐resolution TPL nanofabrication. High‐speed fabrication is achieved by using a bimolecular photosensitizer‐photo acid generator (PS‐PAG) pair that can effectively solve the photosensitivity bottleneck in cationic‐based photoresists. High‐resolution nanofabrication is achieved by limiting the photoacid diffusion via tuning the monomer's intra‐ and inter‐molecular stereo‐structure. The fabrication of 3D structures is demonstrated with fine features (<200 nm), fast writing speed (100 mm s −1 ), and low shrinkage, and showcased the rapid fabrication of centimeter‐scale nanodevices. TP‐EO photoresist shows outstanding TPL fabrication speed and resolution among cationic‐based photoresists, making it a promising solution for high‐throughput 3D nanomanufacturing.