Hybrid alkyl-ligand tin-oxo clusters for enhanced lithographic patterning performance via intramolecular interactions

2025/01/01 by Hao Chen, Wenzheng Li, Yingdong Zhao +6 · 1 voice
Engineering · Materials Science · #Advancements in Photolithography Techniques #Block Copolymer Self-Assembly #Nanofabrication and Lithography Techniques

paper · pdf · doi:10.1039/d5im00058k

openalex publication_date 2025/01/01 · openalex created_date 2025/07/10 · openalex updated_date 2026/07/25

Abstract

Tin-oxo clusters (TOCs) are promising candidates for next-generation extreme ultraviolet (EUV) photoresist materials due to their strong EUV absorption properties and small molecular sizes.

Citations

• Absorption‐coefficient calculation of short‐wavelength photoresist materials: From EUV to BEUV and water window X‐ray

Discussions

• ✨ Read ICM Paper on EUV #photoresists! Tin-oxo clusters (TOCs) are explored as promising candidates for next-generation extreme ultraviolet (EUV) photoresist materials due to their strong EUV absorpt [bsky, 0 points, 0 comments]

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