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Fabrication of silicon W and G center embedded light-emitting diodes for electroluminescence

2024/11/20 by Nikki Ebadollahi, Pradeep Namboodiri, Christian Pederson +6 · 1 voice
Engineering · Materials Science · #Nanowire Synthesis and Applications #Silicon Nanostructures and Photoluminescence #Thin-Film Transistor Technologies

paper · doi:10.1116/6.0004055

openalex publication_date 2024/11/20 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/03

Abstract

The need for reliable quantum light sources drives our research to study color centers (CCs) in silicon as telecommunication O-band emitters. Building from photoluminescence measurements, we compare new electroluminescence measurements. To this end, we synthesized CC-embedded p-i-n junctions in silicon, creating CC light-emitting diode devices. The two types of CCs synthesized were G-centers and W-centers, which show zero-phonon lines at approximately 1279 nm and 1218 nm, respectively. Here, we present our device design, fabrication process flow, and report on the device performance results from measurements to date.

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