Optical properties of fused silica glass using spectroscopic ellipsometry from 0.4 meV to 8.5 eV

2025/07/30 by Prabin Dulal, Madan K. Mainali, Suresh Chaulagain +4 · 1 voice
Engineering · Materials Science · #Glass properties and applications #Luminescence Properties of Advanced Materials #Surface Roughness and Optical Measurements

paper · doi:10.1116/6.0004538

openalex publication_date 2025/07/30 · openalex created_date 2025/10/10 · openalex updated_date 2026/08/01

Abstract

Fused silica is used for a variety of applications due to its high transparency, low thermal expansion, and excellent chemical and thermal stability. Ellipsometric spectra of fused silica glass are collected from three different instruments from the terahertz (0.4 meV) to the vacuum ultraviolet (8.5 eV) range and are modelled simultaneously. Unpolarized transmittance is used to quantify low values of absorption from 0.032 to 8.5 eV. A continuous parameterization of complex dielectric function (ɛ = ɛ1 + iɛ2) spectra from 0.4 meV to 8.5 eV is developed.

Citations

• Optically active oxygen-deficiency-related centers in amorphous silicon dioxide
• Interspecimen Comparison of the Refractive Index of Fused Silica*,†

Discussions

• Fused silica is an amorphous form of pure silica used for a variety of important applications such as substrates for thin films & optical devices. Authors from the University of Toledo present optical [bsky, 1 points, 0 comments]

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