Spirobixanthene surpasses spirobifluorene as key backbone for molecular negative photoresists

2025/05/19 by Yan Yu, Yu Yan, Chenfei Zhao +9 · 1 voice · 1 citation
Engineering · #Advanced Memory and Neural Computing #Advancements in Photolithography Techniques #Thin-Film Transistor Technologies

paper · doi:10.1016/j.cclet.2025.111343

openalex publication_date 2025/05/19 · crossref created 2025/05/19 · openalex created_date 2025/10/10 · crossref issued 2026/05/01 · crossref published 2026/05/01 · crossref published-print 2026/05/01 · crossref deposited 2026/05/01 · crossref indexed 2026/05/04 · openalex updated_date 2026/08/03

Cited by

• Molecular nonchemically amplified resists based on spirobixanthene backbone: Sulfoxime oxime esters versus sulfonium salts

Discussions

• Spirobixanthene surpasses spirobifluorene as key backbone for molecular negative photoresists doi.org/10.1016/j.cc... [bsky, 4 points, 0 comments]