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Two-dimensional nanolithography using atom interferometry

2004/04/28 by A. Gangat, Adil A. Gangat, P. Pradhan +4
Computer Science · Physics and Astronomy · #Cold Atom Physics and Bose-Einstein Condensates #Quantum Information and Cryptography #Quantum Mechanics and Applications #quant-ph

paper · pdf · doi:10.1103/physreva.71.043606

published as Phys. Rev. A 71, 043606 (2005) · 36 pages, 4 figures

arxiv created 2004/04/28 · openalex publication_date 2005/04/12 · arxiv updated 2009/12/01 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28

Abstract

We propose a scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a \ensuremathπ∕2\text\ensuremath-\ensuremathπ\text\ensuremath-\ensuremathπ∕2 atom interferometer with an integrated atom lens system. The lens system is developed such that it allows simultaneous control over the atomic wave-packet spatial extent, trajectory, and phase signature. We demonstrate arbitrary pattern formations with two-dimensional 87Rb wave packets through numerical simulations of the scheme in a practical parameter space. Prospects for experimental realizations of the lithography scheme are also discussed.

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