Mechanism of Thermal Al 2 O 3 Atomic Layer Etching Using Sequential Reactions with Sn(acac) 2 and HF

2015/05/13 by Younghee Lee, Jaime W. DuMont, Steven M. George · 1 citation

paper · doi:10.1021/acs.chemmater.5b00300

Cited by

• Atomic layer etching of niobium nitride using sequential exposures of O2 and H2/SF6 plasmas