1993/10/15 by S. I. Anisimov, С. И. Анисимов, D. Bäuerle +2 · 2 citations
Engineering · Materials Science · #Diamond and Carbon-based Materials Research #Metal and Thin Film Mechanics #Plasma Diagnostics and Applications
paper · doi:10.1103/physrevb.48.12076
openalex publication_date 1993/10/15 · openalex created_date 2016/06/24 · openalex updated_date 2026/07/29
Film-thickness profiles obtained in pulsed-laser deposition are calculated by using the well-known solution of the gas-dynamic equations which describes the expansion of the plasma plume in vacuum. The time for plasma formation is supposed to be short compared with the time of expansion. The film profile depends on the initial dimensions of the plume and on the adiabatic exponent of the vapor.