2024/11/11 by Haoyu Yang, Haoxing Ren, Yang, Haoyu +1
Engineering · #Advanced Surface Polishing Techniques #Advancements in Photolithography Techniques #B.7.2 #Computer Vision and Pattern Recognition (cs.CV) #FOS: Computer and information sciences #FOS: Physical sciences #Nanofabrication and Lithography Techniques #Optics (physics.optics)
paper · pdf · doi:10.48550/arxiv.2411.07311
openalex publication_date 2024/11/11 · openalex created_date 2024/11/16 · openalex updated_date 2026/07/28
Inverse Lithography Technology (ILT) has emerged as a promising solution for photo mask design and optimization. Relying on multi-beam mask writers, ILT enables the creation of free-form curvilinear mask shapes that enhance printed wafer image quality and process window. However, a major challenge in implementing curvilinear ILT for large-scale production is mask rule checking, an area currently under development by foundries and EDA vendors. Although recent research has incorporated mask complexity into the optimization process, much of it focuses on reducing e-beam shots, which does not align with the goals of curvilinear ILT. In this paper, we introduce a GPU-accelerated ILT algorithm that improves not only contour quality and process window but also the precision of curvilinear mask shapes. Our experiments on open benchmarks demonstrate a significant advantage of our algorithm over leading academic ILT engines.