2024/07/28 by Mengzhi Yan, Junlei Zhao, Yan, Mengzhi +13
Engineering · #Advanced Surface Polishing Techniques #FOS: Physical sciences #Optics (physics.optics) #Silicon Carbide Semiconductor Technologies #Thin-Film Transistor Technologies
paper · pdf · doi:10.48550/arxiv.2407.19470
openalex publication_date 2024/07/28 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28
Currently, Si vacancy (VSi) color centers in SiC are of significant interest due to their potential applications in quantum sensing and quantum communication. Meanwhile, the qualities of laser-induced color centers are well guaranteed. Femtosecond laser processing suffices for increasing the yield of VSi color centers in bulk materials and forms crater-shaped enriched regions on the surface. However, there is a notable absence of existing simulation methods to explain the mechanisms behind laser-assisted VSi color center generation. In this work, we design a three-dimensional molecular dynamics (3D-MD) model using an integral hemi-ellipsoidal shell mathematical model to simulate the interaction of Gaussian laser beams with bulk materials. Furthermore, we calculate the transmittance, absorption coefficient, refractive index, and reflectivity of 4H-SiC. Then, the absorptance of a 1030 nm laser in 350 μm-thick 4H-SiC material is abtained to simulate the energy loss during the actual processing. Finally, the study analyzes the movement trajectories of VSi color centers and explains the source of VSi on the surface. This analysis explains the reasons for the enrichment of color centers in the crater-shaped regions formed after laser deposition. Our work provides an effective 3D-MD modeling approach to study the processing mechanisms of laser interaction with semiconductor materials, offering insights into efficient VSi color center creation processes.