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The origin and properties of the wetting layer and early evolution of\n epitaxially strained thin films

2002/01/15 by Helen R. Eisenberg Daniel Kandel, Kandel, Helen R. Eisenberg Daniel
Engineering · Physics and Astronomy · #Adhesion, Friction, and Surface Interactions #FOS: Physical sciences #Fluid Dynamics and Thin Films #Materials Science (cond-mat.mtrl-sci) #Theoretical and Computational Physics #cond-mat.mtrl-sci

paper · pdf · doi:10.48550/arxiv.cond-mat/0201238

14 pages with 12 figures (in 14 eps files)

arxiv created 2002/01/15 · openalex publication_date 2002/01/15 · arxiv updated 2009/11/30 · openalex created_date 2022/10/07 · openalex updated_date 2026/07/28

Abstract

We showed that a wetting layer in epitaxially strained thin films which\ndecreases with increasing lattice mismatch strain arises due to the variation\nof nonlinear elastic free energy with film thickness. We calculated how and at\nwhat thickness a flat film becomes unstable to perturbations of varying size\nfor films with both isotropic and anisotropic surface tension. We showed that\nanisotropic surface tension gives rise to a metastable enlarged wetting layer.\nThe perturbation amplitude needed to destabilize this wetting layer decreases\nwith increasing lattice mismatch. We also studied the early evolution of\nepitaxially strained films. We found that film growth is dependent on the mode\nof material deposition. The growth of a perturbation in a flat film is found to\nobey robust scaling relations. These scaling relations differ for isotropic and\nanisotropic surface tension.\n

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