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DSA-aware multiple patterning for the manufacturing of vias: Connections to graph coloring problems, IP formulations, and numerical experiments

2019/02/11 by Dehia Ait-Ferhat, Vincent Juliard, Ait-Ferhat, Dehia +5
Engineering · #Discrete Mathematics (cs.DM) #FOS: Computer and information sciences #Manufacturing Process and Optimization #Scheduling and Optimization Algorithms #VLSI and FPGA Design Techniques

paper · pdf · doi:10.48550/arxiv.1902.04145

openalex publication_date 2019/02/11 · openalex created_date 2019/02/21 · openalex updated_date 2026/07/28

Abstract

In this paper, we investigate the manufacturing of vias in integrated circuits with a new technology combining lithography and Directed Self Assembly (DSA). Optimizing the production time and costs in this new process entails minimizing the number of lithography steps, which constitutes a generalization of graph coloring. We develop integer programming formulations for several variants of interest in the industry, and then study the computational performance of our formulations on true industrial instances. We show that the best integer programming formulation achieves good computational performance, and indicate potential directions to further speed-up computational time and develop exact approaches feasible for production.

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