2013/11/26 by Prasanta Karmakar, Karmakar, Prasanta, Biswarup Satpati +1
Biochemistry, Genetics and Molecular Biology · Engineering · #Advanced Electron Microscopy Techniques and Applications #FOS: Physical sciences #Integrated Circuits and Semiconductor Failure Analysis #Ion-surface interactions and analysis #Mesoscale and Nanoscale Physics (cond-mat.mes-hall)
paper · pdf · doi:10.48550/arxiv.1311.6646
openalex publication_date 2013/11/26 · openalex created_date 2022/10/04 · openalex updated_date 2026/07/28
We have introduced here a simple, single step and cost effective broad ion\nbeam technique for preparation of nanoscale electronic, magnetic, optical and\nmechanical devices without the need of resist, mask, or focused electron and\nion beams. In this approach, broad beam ion implantation of desired atom on a\nprefabricated ion beam patterned surface promotes site selective deposition by\nadjusting the local angle of ion implantation. We show that implantation of Fe\nions on an O+ induced pre fabricated triangular shaped patterned Si surface\nresults in a self-organized periodic array of striped magnetic nanostructures\nhaving several micron length and about 50 nm width arranged with a lateral\nseparation of ~ 200 nm. The morphology, composition, crystalline structure and\nmagnetic property of these nanopatterns have been analyzed and the crucial\nfeature of such nanopattern formation by broad beam ion implantation is\nexplained.\n